2 techniques of preparing thin films electrolytic deposition techniques vacuum deposition techniques plasma deposition techniques liquid phase deposition techniques solid phase deposition techniques chemical vapour conversion of substrate chemical vapour deposition comparison between cvd and other thin film deposition techniques 3. Chemical vapor deposition cvd is a deposition method used to produce high quality high performance solid materials typically under vacuumthe process is often used in the semiconductor industry to produce thin films in typical cvd the wafer substrate is exposed to one or more volatile precursors which react and or decompose on the substrate surface to produce the desired deposit. 171 present status and future trends in cvd films the explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state of the art semiconductor devices early in the 1960s an old research technique named chemical . We report herein a study of the effect of the 63 k 56 have also found uses as hydrodesulfurisation sulfur precursor on the phase of nbs2 formed by an and hydrodenitrogenation catalysts for hydrotreating reac atmospheric pressure chemical vapour deposition tions in the purification of pertoleum cuts 7
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